Ethynyltrimethylsilane

Laser-induced polymerization of gaseous ethynyltrimethylsilane was used for efficient chemical vapour deposition of polycarbosilane films. Ethynyltrimethylsilane acts as substrate for nickel-catalyzed cross-coupling with benzonitriles.

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Catalog Number CBB1111469
Alternative Name(s) Trimethylsilylacetylene
Molecular Formula (CH3)3SiC≡CH
CAS# 1066-54-2
Purity >98%
Inchi 1S/C5H10Si/c1-5-6(2,3)4/h1H,2-4H3
Inchi Key CWMFRHBXRUITQE-UHFFFAOYSA-N
SMILES C[Si](C)(C)C#C
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