Bis(trimethylsilyl) malonate
Bis(trimethylsilyl) malonate is precursor for metal-organic chemical vapor deposition (MOCVD) of HfO2 and ZrO2 thin films. It undergoes acylation reaction with acid chlorides and acyl carbonates in the presence of triethylamine and magnesium or lithium salts to give β-keto acids or methyl ketones.
| Catalog Number | CBB1118685 |
| Alternative Name(s) | Malonic acid bis(trimethylsilyl ester) |
| Molecular Formula | (CH3)3SiOCOCH2COOSi(CH3)3 |
| CAS# | 18457-04-0 |
| Purity | >98% |
| Inchi | 1S/C9H20O4Si2/c1-14(2,3)12-8(10)7-9(11)13-15(4,5)6/h7H2,1-6H3 |
| Inchi Key | ATCKJLDGNXGLAO-UHFFFAOYSA-N |
| SMILES | C[Si](C)(C)OC(=O)CC(=O)O[Si](C)(C)C |
| Size | Inquiry |
| Supplier Page | https://www.amerigoscientific.com/bistrimethylsilyl-malonate-item-118685.html |